EC Number | Inhibitors | Comment | Organism | Structure |
---|---|---|---|---|
3.1.25.1 | Mg2+ | in presence of 10 mM MgCl2: 10% of the activity observed in presence of 10 mM EDTA | Tequatrovirus T4 | |
3.1.25.1 | NaBH4 | inhibits degradation of the glycosylase product, reduces aldehyde moiety of the apyrimidinic sites to alcohol which results in resistance to endonuclease | Tequatrovirus T4 |
EC Number | Natural Substrates | Organism | Comment (Nat. Sub.) | Natural Products | Comment (Nat. Pro.) | Rev. | Reac. |
---|---|---|---|---|---|---|---|
3.1.25.1 | DNA + H2O | Tequatrovirus T4 | - |
? | - |
? |
EC Number | Organism | UniProt | Comment | Textmining |
---|---|---|---|---|
3.1.25.1 | Tequatrovirus T4 | - |
- |
- |
EC Number | Purification (Comment) | Organism |
---|---|---|
3.1.25.1 | - |
Tequatrovirus T4 |
EC Number | Reaction | Comment | Organism | Reaction ID |
---|---|---|---|---|
3.1.25.1 | endonucleolytic cleavage near pyrimidine dimers to products with 5'-phosphate | cleavage on the 3'-side of the apyrimidinic site | Tequatrovirus T4 | |
3.1.25.1 | endonucleolytic cleavage near pyrimidine dimers to products with 5'-phosphate | 2-step mechanism, pyrimidine dimer-DNA glycosylase and an apurinic/apyrimidinic endonuclease | Tequatrovirus T4 |
EC Number | Source Tissue | Comment | Organism | Textmining |
---|---|---|---|---|
3.1.25.1 | infected cell | T4 infected | Tequatrovirus T4 | - |
EC Number | Substrates | Comment Substrates | Organism | Products | Comment (Products) | Rev. | Reac. |
---|---|---|---|---|---|---|---|
3.1.25.1 | DNA + H2O | - |
Tequatrovirus T4 | ? | - |
? | |
3.1.25.1 | poly(dA)-poly(dT) + H2O | poly(dA)-poly(dT,dU) treated with uracil-DNA glycosylase, endonuclease acts specifically on double-strands | Tequatrovirus T4 | oligonucleotides | - |
? | |
3.1.25.1 | X174 DNA + H2O | UV irradiated RFI of phage X174 containing apurinic sites | Tequatrovirus T4 | RFII | RFII, i.e. nicked circular DNA | ? |